JPH0213483Y2 - - Google Patents
Info
- Publication number
- JPH0213483Y2 JPH0213483Y2 JP3032285U JP3032285U JPH0213483Y2 JP H0213483 Y2 JPH0213483 Y2 JP H0213483Y2 JP 3032285 U JP3032285 U JP 3032285U JP 3032285 U JP3032285 U JP 3032285U JP H0213483 Y2 JPH0213483 Y2 JP H0213483Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- sputtering
- target
- gun
- beam source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 21
- 238000001659 ion-beam spectroscopy Methods 0.000 claims description 11
- 238000005477 sputtering target Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3032285U JPH0213483Y2 (en]) | 1985-03-05 | 1985-03-05 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3032285U JPH0213483Y2 (en]) | 1985-03-05 | 1985-03-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61147262U JPS61147262U (en]) | 1986-09-11 |
JPH0213483Y2 true JPH0213483Y2 (en]) | 1990-04-13 |
Family
ID=30529916
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3032285U Expired JPH0213483Y2 (en]) | 1985-03-05 | 1985-03-05 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0213483Y2 (en]) |
-
1985
- 1985-03-05 JP JP3032285U patent/JPH0213483Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS61147262U (en]) | 1986-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2195486A1 (en) | Metallic thin film and method of manufacturing the same, and surface acoustic wave device using the metallic thin film and the method thereof | |
ATE115647T1 (de) | Physikalische dampfniederschlag- doppelbeschichtungsvorrichtung und verfahren. | |
EP0947603A3 (en) | Film depositing method and apparatus | |
WO1987007651A1 (en) | Semiconductor manufacturing apparatus | |
JPH031378B2 (en]) | ||
EP0686708A4 (en) | METHOD AND APPARATUS FOR FORMING A LAYER ------------------- | |
EP0302684A3 (en) | Thin film deposition process | |
JPH0213483Y2 (en]) | ||
EP0269112A3 (en) | Method of forming a thin crystalline metal film | |
JPS5565239A (en) | Method of forming film of titanium oxide on plastic base plate | |
EP0167383A3 (en) | Apparatus for and a method of modifying the properties of a material | |
CA2016354A1 (en) | Method of fabricating oxide superconducting film | |
JPH07122136B2 (ja) | イオンビームスパッタ装置および運転方法 | |
JPH03264667A (ja) | カルーセル型スパッタリング装置 | |
JPH0726197B2 (ja) | 薄膜形成方法及びその装置 | |
JPS6473075A (en) | Film forming device by ion beam sputtering | |
JPS5761644A (en) | Cover glass having diamond coating layer and its preparation | |
JPS53119671A (en) | Ion implanting method | |
JPH01319673A (ja) | レーザビームスパッタ法 | |
JPS556434A (en) | Sputtering apparatus | |
JPH01319671A (ja) | 多元スパッタリング装置 | |
JPS55110028A (en) | Apparatus for vacuum evaporation having evaporation source for ion beam sputtering | |
JPS61159571A (ja) | スパツタリング装置 | |
JP2589938Y2 (ja) | イオンビームスパッタ装置 | |
JPH02240257A (ja) | 薄膜形成装置 |